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Patent Law in Greater China: Second Edition

Edited by Stefan Luginbuehl, Edited by Peter Ganea

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This thoroughly revised second edition presents a comprehensive assessment of the recently revised patent law and related secondary legislation in the Peopleâ€™s Republic of China (PRC). It examines the latest policy and patent law related aspects in Greater China to reveal valuable insights into the evolving legal landscape. Highly experienced professionals in the field provide practical guidance on the latest practices in technology transfer, patent prosecution, the reformed employee inventions system in the PRC and patent litigation. Key Features: Evaluates Chinaâ€™s latest patent policy and strategy Gives important insights on the latest developments concerning substantive patent law, as well as PCT and national patent application procedures Analyzes emerging issues around standard-essential patents which are gaining traction in an increasingly globalized system Explores developments in patent law in relation to specific areas, such as the pharmaceutical industry, as well as software- and AI-related inventions Draws on extensive case law to shed light on claims interpretation and patent enforcement issues, including infringement and invalidation proceedings, dual enforcements by courts and administrative authorities Explains the latest developments in utility model and design protection Covers the latest patent system developments in the Special Administrative Regions of Hong Kong, Macao and Chinese Taipei, encompassing the entire Greater China region This updated edition of Patent Law in Greater China is an essential resource for lawyers, patent attorneys and other practitioners, as well as policymakers active in the region with an interest in the broader context of patents as key intellectual property rights in an increasingly technology driven world.

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